Multi-Agent Parallel Implementation of Photomask Simulation in Photolithography

Abstract

A framework for paralleling aerial image simulation in photolithography is proposed. Initial data for the simulation representing photomask are considered as a data stream that is processed by a multi-agent computing system. A parallel image processing is based on a graph model of a parallel algorithm. The algorithm is constructed from individual computing operations in a special visual editor. Then the visual representation is converted into XML, which is interpreted by the multi-agent system based on MPI. The system performs run-time dynamic optimization of calculations using an algorithm of virtual associative network. The proposed framework gives a possibility to design and analyze parallel algorithms and to adapt them to architecture of the computing cluster.

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Citation

Avakaw, S. M. Multi-Agent Parallel Implementation of Photomask Simulation in Photolithography [Text] / Syarhei M. Avakaw, Alexander A. Doudkin, Alexander V. Inyutin, Aleksey V. Otwagin, Vladislav A. Rusetsky // Computing = Комп’ютинг. - 2012. - Vol. 11, is. 1. - P. 45-54.

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