Multi-Agent Parallel Implementation of Photomask Simulation in Photolithography
| dc.contributor.author | Avakaw, Syarhei M. | |
| dc.contributor.author | Doudkin, Alexander A. | |
| dc.contributor.author | Inyutin, Alexander V. | |
| dc.contributor.author | Otwagin, Aleksey V. | |
| dc.contributor.author | Rusetsky, Vladislav A. | |
| dc.date.accessioned | 2019-03-30T07:49:58Z | |
| dc.date.available | 2019-03-30T07:49:58Z | |
| dc.date.issued | 2012 | |
| dc.description.abstract | A framework for paralleling aerial image simulation in photolithography is proposed. Initial data for the simulation representing photomask are considered as a data stream that is processed by a multi-agent computing system. A parallel image processing is based on a graph model of a parallel algorithm. The algorithm is constructed from individual computing operations in a special visual editor. Then the visual representation is converted into XML, which is interpreted by the multi-agent system based on MPI. The system performs run-time dynamic optimization of calculations using an algorithm of virtual associative network. The proposed framework gives a possibility to design and analyze parallel algorithms and to adapt them to architecture of the computing cluster. | uk_UA |
| dc.identifier.citation | Avakaw, S. M. Multi-Agent Parallel Implementation of Photomask Simulation in Photolithography [Text] / Syarhei M. Avakaw, Alexander A. Doudkin, Alexander V. Inyutin, Aleksey V. Otwagin, Vladislav A. Rusetsky // Computing = Комп’ютинг. - 2012. - Vol. 11, is. 1. - P. 45-54. | uk_UA |
| dc.identifier.uri | http://dspace.tneu.edu.ua/handle/316497/33239 | |
| dc.publisher | ТНЕУ | uk_UA |
| dc.subject | Aerial Image Simulation | uk_UA |
| dc.subject | Multi-agent | uk_UA |
| dc.subject | Integrated Circuit | uk_UA |
| dc.subject | Photolithography | uk_UA |
| dc.subject | Parallel Algorithm | uk_UA |
| dc.title | Multi-Agent Parallel Implementation of Photomask Simulation in Photolithography | uk_UA |
| dc.type | Article | uk_UA |