Multi-Agent Parallel Implementation of Photomask Simulation in Photolithography

dc.contributor.authorAvakaw, Syarhei M.
dc.contributor.authorDoudkin, Alexander A.
dc.contributor.authorInyutin, Alexander V.
dc.contributor.authorOtwagin, Aleksey V.
dc.contributor.authorRusetsky, Vladislav A.
dc.date.accessioned2019-03-30T07:49:58Z
dc.date.available2019-03-30T07:49:58Z
dc.date.issued2012
dc.description.abstractA framework for paralleling aerial image simulation in photolithography is proposed. Initial data for the simulation representing photomask are considered as a data stream that is processed by a multi-agent computing system. A parallel image processing is based on a graph model of a parallel algorithm. The algorithm is constructed from individual computing operations in a special visual editor. Then the visual representation is converted into XML, which is interpreted by the multi-agent system based on MPI. The system performs run-time dynamic optimization of calculations using an algorithm of virtual associative network. The proposed framework gives a possibility to design and analyze parallel algorithms and to adapt them to architecture of the computing cluster.uk_UA
dc.identifier.citationAvakaw, S. M. Multi-Agent Parallel Implementation of Photomask Simulation in Photolithography [Text] / Syarhei M. Avakaw, Alexander A. Doudkin, Alexander V. Inyutin, Aleksey V. Otwagin, Vladislav A. Rusetsky // Computing = Комп’ютинг. - 2012. - Vol. 11, is. 1. - P. 45-54.uk_UA
dc.identifier.urihttp://dspace.tneu.edu.ua/handle/316497/33239
dc.publisherТНЕУuk_UA
dc.subjectAerial Image Simulationuk_UA
dc.subjectMulti-agentuk_UA
dc.subjectIntegrated Circuituk_UA
dc.subjectPhotolithographyuk_UA
dc.subjectParallel Algorithmuk_UA
dc.titleMulti-Agent Parallel Implementation of Photomask Simulation in Photolithographyuk_UA
dc.typeArticleuk_UA

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